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18th Plansee Seminar - 2013
Jörg Paulitsch (J. Paulitsch)
Talk
"Influence of Si on the Arc Evaporation Behaviour of Al-Cr Targets and Structural Evolution of (Al0.7Cr0.3)2O3 Oxide Coatings "
Paulitsch J.1, Rachbauer R.2, Ramm J.2, Polcik P.3, Koller C.M.1 ,Mayrhofer P.H.4

1Christian Doppler Laboratory for Application Oriented Coating Development at the Institute of Materials Science and Technology, Vienna University of Technology, Austria
2OC Oerlikon Balzers AG, Liechtenstein
3PLANSEE Composite Materials GmbH, Germany
4Institute of Materials Science and Technology, Vienna University of Technology, Austria
Cathodic arc-evaporation is a standard deposition technique to synthesize high quality coatings. Nevertheless, this technique is very sensitive to the reactive gas pressure used, especially when preparing Al-Cr oxides. Recent studies showed that increased oxygen partial pressure supports the formation of crystalline (Al0.7Cr0.3)2O3 coatings. However, higher oxygen partial pressure also promotes the formation of Al-rich oxide islands at the target surface which in turn influence the arc behaviour as well as the film quality. Therefore, powder metallurgical AlxCr1-x-ySiy targets with Si contents y of 1,2,5 and 10at.%were studied for their arc behaviour and their suitability to prepare corundum-type Al-Cr-O oxides. Our investigations show that using AlxCr1-x-ySiy targets with 5 at% Si minimize the unfavourable oxide island formation and promote the formation of dense (Al0.7Cr0.3)2O3 coatings with preferred crystallographic orientations, even at low substrate temperatures of 500 °C. The Si content of these coatings is below the detection limit of elastic recoil detection analysis.
The results clearly indicate that sophisticated target design is essential for the preparation of high quality coatings.
 


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